Netherlands-Based Research Institute Selects USHIO's High-Intensity EUV Light Source for Research and Evaluation

The Netherlands Organization for Applied Scientific Research (hereinafter “TNO”) and USHIO INC. (HQ: Tokyo, President and CEO: Kenji Hamashima) announced that TNO opened an experimental EUV exposure and analysis facility (“EBL2”) on March 27, 2017. Through this facility, TNO provides EUV-related companies and institutions with the services to study and evaluate EUV optics as well as masks, pellicles, and sensors.

TNO’s experimental “EBL2” EUV exposure and analysis facility enables in-situ measurement, including the entire process of handling, radiation, and evaluation of samples under a vacuum environment. USHIO’s high-intensity and high-output EUV light source allows exposure and evaluation of a large field (up to a 6-inch mask) while making a great contribution to shortening of the evaluation period.

Wilbert Staring, Director Strategic Accounts, commented, to develop and build EBL2 the contribution of partners like USHIO played a key contribution to create this unique facility. The partnership with USHIO went very well.
 
With the aim of establishing the EUV lithography process for volume manufacturing, USHIO will further evolve its EUV light source technologies for inspection of ultra-fine-pattern masks, and contribute to evolution of the leading-edge semiconductor fabrication process.
Disclaimers of Warranties
1. The website does not warrant the following:
1.1 The services from the website meets your requirement;
1.2 The accuracy, completeness, or timeliness of the service;
1.3 The accuracy, reliability of conclusions drawn from using the service;
1.4 The accuracy, completeness, or timeliness, or security of any information that you download from the website
2. The services provided by the website is intended for your reference only. The website shall be not be responsible for investment decisions, damages, or other losses resulting from use of the website or the information contained therein<
Proprietary Rights
You may not reproduce, modify, create derivative works from, display, perform, publish, distribute, disseminate, broadcast or circulate to any third party, any materials contained on the services without the express prior written consent of the website or its legal owner.

Cree announces the commercial availability of the XLamp® XD16 LED, the industry’s first Extreme Density LED, which delivers up to 5 ½ times higher lumen density than Cree’s previous generation of high power LEDs.

READ MORE

LG Innotek today announced that the company has developed the world's first 100mW (mill watts) UV-C LED. This development is 2 years ahead of the industry forecast that predicted its development would be successful by 2020.

READ MORE