EULITHA, a Swiss startup company offering innovative lithography equipment and services for the nanotechnology, photonics and optoelectronic markets announced today the delivery of its unique PhableR 100 photolithography tool to the MESA + NanoLab of the University of Twente in the Netherlands. The system incorporating Eulitha’s proprietary Displacement Talbot Lithography technology will enable researchers of this interdisciplinary research institute to perform high resolution lithography on different substrates without the severely limiting requirements such as flatness or conductivity one faces with previously available technologies.