Veeco introduces the TurboDisc® K465i™ gallium nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) System for the production of high-brightness light-emitting diodes (HB LEDs). Veeco’s industry-leading beta site customers rapidly qualified the K465i for volume production, and the Company has received orders for the system from multiple LED customers throughout the Asia Pacific region.

Based on Veeco’s production-proven K-Series platform, the new TurboDisc K465i combines the industry’s highest productivity with the capability to drive best-in-class LED yields approaching 90 percent in a 5nm bin. Fully automated with only a short recovery period required after maintenance, the TurboDisc K465i enables higher productivity and reduced cost of ownership compared to competitive tools.

TurboDisc K465i: Uniformity and Repeatability by Design

At the heart of the TurboDisc K465i GaN MOCVD System is Veeco’s patent pending Uniform FlowFlange® technology. Designed to create a uniform alkyl and hydride flow pattern across all wafers, the K465i delivers superior uniformity and repeatability with the industry’s lowest particle generation. The FlowFlange’s simplified design provides ease-of-tuning for fast process optimization on wafer sizes up to 8 inches and fast tool recovery time after maintenance for the LED industry’s highest productivity.

To listen to a podcast series about high-volume LED manufacturing and for further information about the K465i, please visit www.veeco.com/mocvd