LandMark Optoelectronics Expands Production Capacity with AIXTRON MOCVD

AIXTRON, a worldwide leading provider of deposition equipment to the semiconductor industry, announced today that LandMark Optoelectronics Corporation, a supplier in gallium arsenide (GaAs) and indium phosphide (InP) based epitaxial wafers for optical communication, industrial application, and special-purpose usage, has purchased another AIX 2800G4-TM system for the production of laser diode devices. The tool is due for delivery in the first quarter 2016.

Planetary Reactor platform AIX 2800G4-TM. (Photo courtesy of AIXTRON)

Based on AIXTRON’s production-proven Planetary Reactor® platform, the AIX 2800G4-TM offers best-in-class process performance and deposition uniformity that lead to unmatched yield results. Particularly suitable for the production of high-performance laser diodes, the system is complemented by a highly efficient Transfer Module (TM) that enables higher throughput and reduced cycle times. In addition, the equipment design allows flexible configuration of wafers from 2 to 8 inch to address customer’s products evolution over time while at the same time lowering the cost per wafer to a minimum.

“Our AIX 2800G4-TM perfectly matches LandMark’s requirements for cost-efficient highvolume production of laser wafers. We will provide full support to LandMark to enable our customer to start up production with the new tool as quickly as possible”, says Dr. Bernd Schulte, Executive Vice President and COO of AIXTRON.

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