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Home > EUV lithography
2017-06-12

Netherlands-Based Research Institute Selects USHIO's High-Intensity EUV Light Source for Research and Evaluation

The Netherlands Organization for Applied Scientific Research (hereinafter “TNO”) and USHIO INC. (HQ: Tokyo, President and CEO: Kenji Hamashima) announced that TNO opened an experimental EUV exposure and analysis facility (“EBL2”) on March 27, 2017. Through this facility, TNO provides EUV-related companies and institutions with the services to study and evaluate EUV optics as well as masks, pellicles, and sensors.
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