2017-06-12

Netherlands-Based Research Institute Selects USHIO's High-Intensity EUV Light Source for Research and Evaluation

The Netherlands Organization for Applied Scientific Research (hereinafter “TNO”) and USHIO INC. (HQ: Tokyo, President and CEO: Kenji Hamashima) announced that TNO opened an experimental EUV exposure and analysis facility (“EBL2”) on March 27, 2017. Through this facility, TNO provides EUV-related companies and institutions with the services to study and evaluate EUV optics as well as masks, pellicles, and sensors.
Continue reading

VueReal, the pioneer of MicroSolid Printing™, today announced a significant expansion of its Reference Design Kit (RDK) portfolio with new industry-specific bundles. Purpose-built for automotive and consumer electronics, the vertical RDK... READ MORE

ViewSonic Corp., a leading global provider of visual and edtech solutions, announces the shipping of LDS138-151, a 138-inch all-in-one, mobile Direct View LED Display Solution Kit. The ViewSonic LDS138-151 is a fully pre-assembled kit that bui... READ MORE