Kyma Technologies Inc of Raleigh, NC, USA, has made a breakthrough on its new high-volume AlN template manufacturing tool by producing what is said to be the world’s first 300mm (12-inch) diameter AlN-on-silicon template for GaN.

It claims that its process is the first that is capable of direct insertion into existing LED and power device production processes that grow GaN and related alloys such as InGaN and AlGaN.

The new AlN template tool was designed and constructed by chief engineer Dr Bob Metzger, and it was incorporates many of the features of, as well as improvements to, Kyma’s patented and proprietary III-N Physical Vapor Deposition of NanoColumns (PVDNC) technology.
 
Additionally, the company also plans to demonstrate large-diameter AlN templates on sapphire and to release the new AlN template tool for full production in the coming weeks.