The UK’s Oxford Instruments Plasma Technology, a supplier of plasma etch and deposition high-volume manufacturing (HVM) solutions, has had its remote-plasma atomic layer deposition (ALD) nitride passivation solution qualified for full production by a US-based power electronics manufacturer of gallium nitride (GaN) devices, supporting the first phase of its ramp. GaN-based devices are now well established in the consumer market, with a wide range of rapid chargers available commercially to support mobile devices. Fast charging and a smaller footprint are among the...

Oxford Instruments Plasma Technology (OIPT) announced that it has worked with Taiwan’s Industrial Technology Research Institute (ITRI) by providing multiple PlasmaPro 100 systems including both etch and deposition for ITRI’s Micro LED R&D program. The PlasmaPro 100 ICP process solutions are designed to support leading edge device applications such as Lasers, RF, Power and advanced LEDs. ITRI has been developing Micro LED technology since 2009. In 2018, with the cooperation with Macroblock, Unimicron and PlayNitrid...