2013-10-02

Fujifilm and imec Make New Photoresist Technology for Organic Semiconductors

Fujifilm Corporation and imec have developed a new *photoresist technology for **organic semiconductors that enables the realization of submicron patterns. (For * please see note at bottom for further explanations.)
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The CLEDIA project, co-financed by the Auvergne-Rhône-Alpes A group of logos with different names AI-generated content may be incorrect. Region and Bpifrance has just been completed after three years of collaborative innovation between P... READ MORE

Seoul Semiconductor has developed an innovative LED light source—SunLike—that reproduces a spectrum nearly identical to natural sunlight. The technology is gaining attention for its positive effects on eye health, including reducing ... READ MORE