2019-07-15

Taiwan-based Research Team Develops Low-temperature GaN Wafer Technology to Reduce Micro LED Production Cost

A research team led by a professor from Department of Optics and Photonics at Taiwan’s National Central University revealed a new production method for Micro LED epitaxy wafer. The team developed GaN thin film wafer under low temperature via an approach of high-energy physic. According to the researchers, the method would cost only one tenth of the current Micro LED production cost and could be applied for mass production. (Image:NCU) By combining data analysis and semiconductor manufacture process, the researchers aim to find innovative approaches for M...
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Seoul Semiconductor's future vehicle display LED technology unveiled at SID (Graphic: Seoul Semiconductor) SEOUL, South Korea--(BUSINESS WIRE)--Seoul Semiconductor (KOSDAQ:046890), a global optical semiconductor company, will participate i... READ MORE

ALIYOS™ technology pushes boundaries of multi-segmented area lighting and enables customization of light emission patterns Characteristics such as transparency, thinness, 2.5D bendability and freedom to create new lighting effects enable... READ MORE